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Product Name: |
Tungsten Titanium Target
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Supply Ability: |
10000 |
Related proudcts |
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Specifications |
99.99% |
Price Term: |
FOB |
Port of loading: |
changsha |
Minimum Order |
1 |
Unit Price: |
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Application:
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
Specification:WTi10,WTi20 Purity: 99.99%; 99.999% Flatness£º¡Ü2%£» Diameter:150¡«350 Thickness:6¡«25 Grain size:¡Û50¦Ìm
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Company: |
Hunan Ultra Minor Metals Ltd
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Contact: |
Ms. Apple YI |
Address: |
Rm.101,Bldg.10, Xinggong Science and Technology Park, No.100 Luyun Rd.,Changsha High-tech Industrial Development Zone, Changsha Hunan, China |
Postcode: |
410000 |
Tel: |
+8673188590095 |
Fax: |
86 731 88590095 |
E-mail: |
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